Patent Assignment
Reel/Frame 042656/0253
Assignment of Assignor's Interest
Recorded: 2017-06-08
Pages: 6
Assignors
STACHOWIAK, TIMOTHY
Executed: 2016-10-14
LIU, WEIJUN
Executed: 2016-10-14
WAN, FEN
Executed: 2016-10-14
DOYLE, GARY
Executed: 2016-10-24
KHUSNATDINOV, NIYAZ
Executed: 2017-02-22
Assignee
CANON KABUSHIKI KAISHA
30-2, SHIMOMARUKO 3-CHOME, OHTA-KU, TOKYO, 146-8501, JAPAN
Covered Property
(1)
Substrate Pretreatment and Etch Uniformity in Nanoimprint Lithography