Patent Assignment
Reel/Frame 042678/0468
Assignment of Assignor's Interest
Recorded: 2017-06-12
Pages: 2
Assignor
HARIYA, HIDEKI
Executed: 2017-03-30
Assignee
SHIN-ETSU HANDOTAI CO., LTD.
2-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, 100-0004, JAPAN
Covered Property
(1)
Method of Manufacturing an Epitaxial Wafer Comprising Measuring a Level Difference Between a Front Surface of a Susceptor and an Upper Surface of a Lift Pin and Adjusting a Ratio of the Heat Source Output