IP Library Assignment 043027/0851
Patent Assignment
Reel/Frame 043027/0851

Assignment of Assignor's Interest

Recorded: 2017-07-18 Pages: 4
Assignors
NAGATSU, KOTARO
Executed: 2017-06-26
SENDA, SHINICHIRO
Executed: 2017-06-26
Assignee
JX NIPPON MINING & METALS CORPORATION
1-2, OTEMACHI 1-CHOME, CHIYODA-KU, TOKYO, 100-8164, JAPAN
Covered Property (1)
Tantalum Sputtering Target, and Production Method Therefor
Application: 15/543,738 →
Publication: US 2017/0372879
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057160/0114 →