Patent Assignment
Reel/Frame 043146/0624
Assignment of Assignor's Interest
Recorded: 2017-07-31
Pages: 7
Assignors
IWAYA, TORU
Executed: 2017-06-16
TAKASU, HISAYUKI
Executed: 2017-06-28
KOUBORI, SAKAE
Executed: 2017-07-04
KAMINO, ATSUSHI
Executed: 2017-07-04
HORINOUCHI, KENTO
Executed: 2017-06-30
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Mask Position Adjustment Method of Ion Milling, Electron Microscope Capable of Adjusting Mask Position, Mask Adjustment Device Mounted on Sample Stage and Sample Mask Component of Ion Milling Device
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.