Patent Assignment
Reel/Frame 043530/0018
Assignment of Assignor's Interest
Recorded: 2017-09-08
Pages: 8
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Substrate Processing Apparatus and Substrate Processing Method of Controlling Discharge Angle and Discharge Position of Processing Liquid Supplied to Peripheral Portion of Substrate