IP Library › Assignment 043604/0897
Patent Assignment
Reel/Frame 043604/0897

Assignment of Assignor's Interest

Recorded: 2017-09-15 Pages: 2
Assignors
TANAKA, JUNYA
Executed: 2017-07-28
ONO, TETSUO
Executed: 2017-08-02
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property (1)
Plasma Processing Method and Plasma Processing Device
Application: 15/556,455 →
Publication: US 2018/0047573
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →