Patent Assignment
Reel/Frame 043820/0870
Assignment of Partial Rights
Recorded: 2017-09-12
Pages: 4
Assignee
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(3)
Resist-Pattern-Forming Method and Chemically Amplified Resist Material
Pattern-Forming Method
Chemically Amplified Resist Material, Pattern-Forming Method, Compound, and Production Method of Compound
Related Assignments
(5)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Feb 1, 2017
From: NAKAGAWA, HISASHI; NARUOKA, TAKEHIKO; NAGAI, TOMOKI; TAGAWA, SEIICHI
To: OSAKA UNIVERSITY; TOKYO ELECTRON LIMITED
Reel/Frame 041148/0216 →
Assignment of Assignor's Interest
Feb 2, 2017
From: NAKAGAWA, HISASHI; NARUOKA, TAKEHIKO; NAGAI, TOMOKI; TAGAWA, SEIICHI
To: OSAKA UNIVERSITY; TOKYO ELECTRON LIMITED
Reel/Frame 041151/0797 →
Assignment of Assignor's Interest
Mar 16, 2017
From: NAKAGAWA, HISASHI; NARUOKA, TAKEHIKO; NAGAI, TOMOKI; TAGAWA, SEIICHI
To: OSAKA UNIVERSITY; TOKYO ELECTRON LIMITED
Reel/Frame 041590/0784 →
Change of Name
Sep 22, 2025
From: JICC-02 CORPORATION
To: JSR CORPORATION
Reel/Frame 072326/0282 →
Merger
Sep 22, 2025
From: JSR CORPORATION
To: JICC-02 CORPORATION
Reel/Frame 072935/0152 →