Patent Assignment
Reel/Frame 044155/0726
Assignment of Assignor's Interest
Recorded: 2017-11-16
Pages: 3
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Method of Forming Gate Spacer for Nanowire Fet Device