Patent Assignment
Reel/Frame 044335/0126
Assignment of Assignor's Interest
Recorded: 2017-12-07
Pages: 7
Assignors
ZHOU, XIANG
Executed: 2017-11-16
UPADHYAYA, GANESH
Executed: 2017-11-17
KIMURA, YOSHIE
Executed: 2017-11-17
ZHU, WEIYE
Executed: 2017-11-21
HAN, ZHAOHONG
Executed: 2017-11-15
LEE, SEOKHWAN
Executed: 2017-11-16
SUN, NOEL
Executed: 2017-12-06
Assignee
LAM RESEARCH CORPORATION
4650 CUSHING PARKWAY, FREMONT, CALIFORNIA, 94538
Covered Property
(1)
Atomic Layer Deposition and Etch in a Single Plasma Chamber for Fin Field Effect Transistor Formation