IP Library Assignment 044465/0169
Patent Assignment
Reel/Frame 044465/0169

Assignment of Assignor's Interest

Recorded: 2017-12-21 Pages: 4
Assignors
WANG, CHAO-HSUN
Executed: 2017-12-05
CHAO, KUO-YI
Executed: 2017-12-05
LIN, RUEIJER
Executed: 2017-12-05
KAO, CHEN-YUAN
Executed: 2017-12-05
WANG, MEI-YUN
Executed: 2017-12-05
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO. 8, LI-HSIN ROAD 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Fin Field Effect Transistor (Finfet) Device Structure with Conductive Layer Between Gate and Gate Contact
Application: 15/821,994 →
Publication: US 2019/0165176