IP Library Assignment 044522/0987
Patent Assignment
Reel/Frame 044522/0987

Assignment of Assignor's Interest

Recorded: 2018-01-03 Pages: 4
Assignors
HO, CHIA-CHENG
Executed: 2017-12-21
LIN, MING-SHIANG
Executed: 2017-12-22
PENG, CHENG-YI
Executed: 2017-12-21
LU, CHUN-CHIEH
Executed: 2017-12-21
CHANG, CHIH-SHENG
Executed: 2017-12-21
DIAZ, CARLOS H.
Executed: 2017-12-21
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSINCHU, 300, TAIWAN
Covered Property (1)
Method of Manufacturing a Semiconductor Device Having a Gate with Ferroelectric Layer
Application: 15/860,912 →
Publication: US 2019/0097061