IP Library Assignment 045146/0967
Patent Assignment
Reel/Frame 045146/0967

Assignment of Assignor's Interest

Recorded: 2018-03-08 Pages: 5
Assignors
NAGAI, HIROKO
Executed: 2018-02-07
WATANABE, TAKERU
Executed: 2018-02-07
KORI, DAISUKE
Executed: 2018-02-07
OGIHARA, TSUTOMU
Executed: 2018-02-07
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property (1)
Resist Underlayer Film Composition, Patterning Process, and Method for Forming Resist Underlayer Film
Application: 15/915,748 →
Publication: US 2018/0284615