IP Library › Assignment 045357/0178
Patent Assignment
Reel/Frame 045357/0178

Assignment of Assignor's Interest

Recorded: 2018-03-27 Pages: 2
Assignors
HSU, CHIH-YU
Executed: 2018-03-27
SHEN, PENG
Executed: 2018-03-27
Assignee
Covered Property (1)
Methods of Minimizing Plasma-Induced Sidewall Damage During Low K Etch Processes
Application: 15/923,722 →
Publication: US 2018/0211845
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 27, 2018
From: STAFFORD, NATHAN
To: AIR LIQUIDE ELECTRONICS U.S. LP
Reel/Frame 045727/0183 →