IP Library › Assignment 045740/0122
Patent Assignment
Reel/Frame 045740/0122

Assignment of Assignor's Interest

Recorded: 2018-05-08 Pages: 4
Assignors
HUANG, JU-LI
Executed: 2018-03-08
LIANG, CHUN-SHENG
Executed: 2018-03-08
HUANG, MING-CHI
Executed: 2018-03-08
YEH, MING-HSI
Executed: 2018-03-08
CHUANG, YING-LIANG
Executed: 2018-03-08
CHIANG, HSIN-CHE
Executed: 2018-03-08
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, TAIWAN
Covered Property (1)
Method of Forming a Metal Gate Using Monolayers
Application: 15/909,847 →
Publication: US 2019/0273149