IP Library Assignment 046120/0726
Patent Assignment
Reel/Frame 046120/0726

Assignment of Assignor's Interest

Recorded: 2018-06-18 Pages: 5
Assignors
YU, JIA
Executed: 2018-06-11
ISHIBASHI, NAOTO
Executed: 2018-06-11
FUKADA, KEISUKE
Executed: 2018-06-11
UTASHIRO, TOMOYA
Executed: 2018-06-11
ATSUMI, HIRONORI
Executed: 2018-06-11
Assignee
SHOWA DENKO K.K.
13-9, SHIBADAIMON 1-CHOME, MINATO-KU, TOKYO, 105-8518, JAPAN
Covered Property (1)
Wafer Supporting Mechanism, Chemical Vapor Deposition Apparatus, and Epitaxial Wafer Manufacturing Method
Application: 16/063,391 →
Publication: US 2018/0371640
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →