IP Library Assignment 046132/0678
Patent Assignment
Reel/Frame 046132/0678

Assignment of Assignor's Interest

Recorded: 2018-06-19 Pages: 4
Assignors
MUTO, DAISUKE
Executed: 2018-06-08
MIYASAKA, AKIRA
Executed: 2018-06-08
Assignee
SHOWA DENKO K.K.
13-9, SHIBADAIMON 1-CHOME, MINATO-KU, TOKYO, 105-8518, JAPAN
Covered Property (1)
Method for Producing Sic Epitaxial Wafer Including Forming Epitaxial Layer Under Different Conditions
Application: 16/063,911 →
Publication: US 2018/0371641
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jun 23, 2023
From: SHOWA DENKO K.K.
To: RESONAC CORPORATION
Reel/Frame 064082/0513 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →