Patent Assignment
Reel/Frame 046178/0866
Assignment of Assignor's Interest
Recorded: 2018-06-22
Pages: 2
Assignors
KAWANAMI, YOSHIMI
Executed: 2017-12-27
KOBARU, ATSUSHI
Executed: 2018-01-09
HASHIZUME, TOMIHIRO
Executed: 2018-01-15
SHICHI, HIROYASU
Executed: 2018-01-16
MATSUBARA, SHINICHI
Executed: 2018-01-16
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8717, JAPAN
Covered Property
(1)
Ion Beam Device and Cleaning Method for Gas Field Ion Source
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.