Patent Assignment
Reel/Frame 046429/0764
Assignment of Assignor's Interest
Recorded: 2018-06-26
Pages: 3
Assignors
KHUSNATDINOV, NIYAZ
Executed: 2016-07-29
STACHOWIAK, TIMOTHY BRIAN
Executed: 2016-07-29
LIU, WEIJUN
Executed: 2016-07-29
Assignee
CANON KABUSHIKI KAISHA
30-2, SHIMOMARUKO 3-CHOME, OHTA-KU, TOKYO, 146-8501, JAPAN
Covered Property
(1)
Substrate Pretreatment for Reducing Fill Time in Nanoimprint Lithography