Patent Assignment
Reel/Frame 046573/0756
Assignment of Assignor's Interest
Recorded: 2018-08-07
Pages: 6
Assignors
KATO, HITOSHI
Executed: 2018-08-03
TAKAHASHI, YUTAKA
Executed: 2018-08-03
KUBO, KAZUMI
Executed: 2018-08-03
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU,, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Method for Depositing a Silicon Nitride Film and Film Deposition Apparatus