Patent Assignment
Reel/Frame 046734/0600
Assignment of Assignor's Interest
Recorded: 2018-08-29
Pages: 3
Assignors
TSAI, TSUNG-HAN
Executed: 2018-08-06
LU, JEN-HSIANG
Executed: 2018-08-06
CHANG, SHIH-HSUN
Executed: 2018-08-06
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO. 8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property
(1)
Method for Forming Finfet and Gate-All-Around Fet with Selective High-K Oxide Deposition