IP Library Assignment 046781/0001
Patent Assignment
Reel/Frame 046781/0001

Assignment of Assignor's Interest

Recorded: 2018-09-04 Pages: 4
Assignors
CHANG, I-MING
Executed: 2018-07-12
LIN, CHIH-CHENG
Executed: 2018-07-16
WU, CHI-YING
Executed: 2018-07-16
YOU, WEI-MING
Executed: 2018-07-16
FANG, ZIWEI
Executed: 2018-07-12
CHAO, HUANG-LIN
Executed: 2018-07-12
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO. 8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Method for Forming Semiconductor Device Structure Having Oxide Layer
Application: 16/035,159 →
Publication: US 2020/0020544