Patent Assignment
Reel/Frame 046981/0277
Assignment of Assignor's Interest
Recorded: 2018-09-26
Pages: 5
Assignors
CHIU, WEI-CHAO
Executed: 2016-02-02
WANG, CHIH-CHIEN
Executed: 2016-02-02
SHIU, FENG-JIA
Executed: 2016-02-02
KUO, CHING-SEN
Executed: 2016-02-04
CHANG, CHUN-WEI
Executed: 2016-02-02
TZENG, KAI
Executed: 2016-02-02
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property
(1)
Method of Using a Surfactant-Containing Shrinkage Material to Prevent Photoresist Pattern Collapse Caused by Capillary Forces