IP Library Assignment 047788/0012
Patent Assignment
Reel/Frame 047788/0012

Assignment of Assignor's Interest

Recorded: 2018-12-11 Pages: 2
Assignors
MOOS, PATRICK
Executed: 2018-12-04
HECHT, HANNES
Executed: 2018-12-04
Assignee
SILTRONIC AG
HANNS-SEIDEL-PLATZ 4, MUNICH, 81737, GERMANY
Covered Property (1)
Device for Handling a Semiconductor Wafer in an Epitaxy Reactor and Method for Producing a Semiconductor Wafer Having an Epitaxial Layer
Application: 16/309,014 →
Publication: US 2019/0311941
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Address Jun 30, 2021
From: SILTRONIC AG
To: SILTRONIC AG
Reel/Frame 056719/0881 →
Corrective Assignment to Correct the Date of the Change of Address from 03/12/2020 to 12/03/2020 Previously Recorded at Reel: 056719 Frame: 0881. Assignor(S) Hereby Confirms the Assignment. Jul 1, 2021
From: SILTRONIC AG
To: SILTRONIC AG
Reel/Frame 057561/0451 →