Assignment of Assignor's Interest

Recorded: 2018-12-18 Pages: 6

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Assignors

ONO, YOSUKE

Executed: 2018-10-25

OKUBO, ATSUSHI

Executed: 2018-10-25

KOHMURA, KAZUO

Executed: 2018-10-26

SEKIGUCHI, ATSUKO

Executed: 2018-10-25

KATO, YUICHI

Executed: 2018-10-25

YAMADA, TAKEO

Executed: 2018-10-25

Assignees

MITSUI CHEMICALS, INC.

5-2, HIGASHI-SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, 1057122, JAPAN

NATIONAL INSTITUTE OD ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

3-1 KASUMIGASEKI 1-CHOME, CHIYODA-KU, TOKYO, 1008921, JAPAN

Covered Property (1)

Pellicle Film, Pellicle Frame, Pellicle, Method for Producing Same, Original Plate for Light Exposure, Light Exposure Apparatus and Method for Manufacturing Semiconductor Device

Patent: 11,042,085 →

Application: 16/224,028 →

Publication: US 2019/0129300

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.

Corrective Assignment to Correct the Typo in the Second Assignee's Name Previously Recorded at Reel: 047808 Frame: 0308. Assignor(S) Hereby Confirms the Assignment. Feb 13, 2019

From: ONO, YOSUKE; OKUBO, ATSUSHI; KOHMURA, KAZUO; SEKIGUCHI, ATSUKO

To: MITSUI CHEMICALS, INC.; NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Reel/Frame 049157/0761 →