IP Library › Assignment 048168/0028
Patent Assignment
Reel/Frame 048168/0028

Assignment of Assignor's Interest

Recorded: 2019-01-29 Pages: 7
Assignors
LEE, CHEONKYU
Executed: 2018-11-14
KIM, MOONSEOK
Executed: 2018-11-16
BYUN, IKSU
Executed: 2018-11-15
SONG, CHANGWOO
Executed: 2018-11-14
JEONG, SEONGHA
Executed: 2018-11-20
HAN, DONGSEOK
Executed: 2018-11-14
Assignee
SAMSUNG ELECTRONICS CO., LTD.
129, SAMSUNG-RO, YEONGTONG-GU, SUWON-SI, GYEONGGI-DO, 16677, KOREA, REPUBLIC OF
Covered Property (1)
Method of Etching at Low Temperature and Plasma Etching Apparatus
Application: 16/260,816 →
Publication: US 2019/0385860