IP Library Assignment 048263/0633
Patent Assignment
Reel/Frame 048263/0633

Assignment of Assignor's Interest

Recorded: 2019-02-05 Pages: 4
Assignor
LEE, SANG IN
Executed: 2019-01-28
Assignee
NOVA ENGINEERING FILMS, INC.
24017 OAK KNOLL CIR., LOS ALTOS, CALIFORNIA, 94022
Covered Properties (8)
Thin Film Fabrication Apparatus and Applications Thereof
Application: 62/482,128 →
Plasma reactor with electrode structure for uniform plasma generation
Application: 62/598,936 →
Depositing of Material by Spraying Precursor Using Supercritical Fluid
Application: 15/942,205 →
Publication: US 2018/0290171
Plasma Reactor Having Variable Gas Entraining Opening
Application: 62/647,435 →
Ballistic injection of precursor to perform Infiltration or impregnation process for modifying surface properties
Application: 62/727,417 →
Multiple Entraining Gas Openings for Uniform Precursor Injection or Spray
Application: 62/742,842 →
Spray Plasma Deposition for Nanometer Thickness Films
Application: 62/747,054 →
Depositing of Material by Spraying Precursor Using Supercritical Fluid
Related Assignments (1)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest Aug 3, 2019
From: LEE, SANG IN
To: NOVA ENGINEERING FILMS, INC.
Reel/Frame 049951/0641 →