Patent Assignment
Reel/Frame 048996/0031
Assignment of Assignor's Interest
Recorded: 2019-04-25
Pages: 4
Assignee
TOKYO ELECTRON LIMITED
3-1 AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Method of Selectively Etching First Region Made of Silicon Nitride Against Second Region Made of Silicon Oxide