Patent Assignment
Reel/Frame 049511/0281
Assignment of Assignor's Interest
Recorded: 2019-06-18
Pages: 8
Assignors
LIN, CHUN-HSIUNG
Executed: 2019-05-30
CHEN, SHIH-CHENG
Executed: 2019-05-20
WANG, CHIH-HAO
Executed: 2019-05-22
CHANG, JUNG-HUNG
Executed: 2019-05-20
HUANG, JUI-CHIEN
Executed: 2019-05-20
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property
(1)
Methods of Forming Silicide Contact in Field-Effect Transistors