Patent Assignment
Reel/Frame 049798/0606
Assignment of Assignor's Interest
Recorded: 2019-07-19
Pages: 5
Assignor
KATO, HITOSHI
Executed: 2019-07-11
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU,, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Method for Depositing a Silicon Nitride Film and Film Deposition Apparatus