IP Library Assignment 050277/0482
Patent Assignment
Reel/Frame 050277/0482

Corrective Assignment to Correct the Assignor Takashi Shimazu Doc Date Previously Recorded on Reel 048448 Frame 0773. Assignor(S) Hereby Confirms the Assignment.

Recorded: 2019-09-05 Pages: 5
Assignors
YAMAZAKI, SHUNPEI
Executed: 2012-05-15
MARUYAMA, TETSUNORI
Executed: 2012-05-17
IMOTO, YUKI
Executed: 2012-05-17
SATO, HITOMI
Executed: 2012-05-17
WATANABE, MASAHIRO
Executed: 2012-05-14
MASHIYAMA, MITSUO
Executed: 2012-05-14
OKAZAKI, KENICHI
Executed: 2012-05-14
NAKASHIMA, MOTOKI
Executed: 2012-05-22
SHIMAZU, TAKASHI
Executed: 2012-05-22
Assignee
SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
398 HASE, ATSUGI-SHI, KANAGAWA-KEN, 243-0036, JAPAN
Covered Property (1)
Sputtering Target, Method for Manufacturing Sputtering Target, and Method for Forming Thin Film
Application: 16/285,297 →
Publication: US 2019/0185986
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Feb 27, 2019
From: YAMAZAKI, SHUNPEI; MARUYAMA, TETSUNORI; IMOTO, YUKI; SATO, HITOMI
To: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Reel/Frame 048448/0773 →