IP Library Assignment 050666/0885
Patent Assignment
Reel/Frame 050666/0885

Assignment of Assignor's Interest

Recorded: 2019-10-09 Pages: 9
Assignors
NOSAKA, NAOYA
Executed: 2019-09-27
WAKAMATSU, GOJI
Executed: 2019-09-12
ABE, TSUBASA
Executed: 2019-09-12
MIURA, ICHIHIRO
Executed: 2019-09-12
EHARA, KENGO
Executed: 2019-09-25
NAKATSU, HIROKI
Executed: 2019-09-19
NAKAGAWA, HIROKI
Executed: 2019-10-01
Assignee
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Composition for Resist Underlayer Film Formation, Resist Underlayer Film and Formation Method Thereof, and Patterned Substrate Production Method
Application: 16/564,499 →
Publication: US 2020/0012193
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
Change of Name Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →