Patent Assignment
Reel/Frame 051660/0942
Assignment of Assignor's Interest
Recorded: 2020-01-29
Pages: 4
Assignors
NISHIDE, DAISUKE
Executed: 2020-01-20
HISAMATSU, TORU
Executed: 2020-01-16
ISHIKAWA, SHINYA
Executed: 2020-01-20
Assignee
TOKYO ELECTRON LIMITED
3-1 AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Etching Method, Plasma Processing Apparatus, and Processing System