Patent Assignment
Reel/Frame 051813/0123
Assignment of Assignor's Interest
Recorded: 2020-02-13
Pages: 4
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO.8, LI-HSIN RD. 6, SCIENCE BASED INDUSTRIAL PARK, HSINCHU, 300, TAIWAN
Covered Property
(1)
Method of Forming Shaped Source/Drain Epitaxial Layers of a Semiconductor Device