Assignment of Assignor's Interest

Recorded: 2020-04-01 Pages: 2

Assignor

TOYOTA JIDOSHA KABUSHIKI KAISHA

Executed: 2019-12-24

Assignee

DENSO CORPORATION

1-1, SHOWA-CHO, KARIYA-CITY, AICHI-PREF., 448-8661, JAPAN

Covered Property (1)

Method of Making Silicon Carbide Semiconductor Device Having Multi-Layered Passivation Film with Uneven Surfaces

Patent: 7,825,017 →

Application: 12/406,578 →

Publication: US 2009/0236611

Related Assignments (1)

Other recorded transfers of the patent in this record — the chain of ownership.