Patent Assignment
Reel/Frame 052455/0841
Assignment of Assignor's Interest
Recorded: 2020-04-21
Pages: 4
Assignors
BANINE, VADIM YEVGENYEVICH
Executed: 2015-08-28
SCACCABAROZZI, LUIGI
Executed: 2015-08-28
NIENHUYS, HAN-KWANG
Executed: 2015-08-28
Assignee
ASML NETHERLANDS B.V.
P.O. BOX 324, VELDHOVEN, 5500 AH, NETHERLANDS
Covered Property
(1)
Suppression Filter, Radiation Collector and Radiation Source for a Lithographic Apparatus; Method of Determining a Separation Distance Between at Least Two Reflective Surface Levels of a Suppression Filter