Patent Assignment
Reel/Frame 053558/0427
Assignment of Assignor's Interest
Recorded: 2020-08-20
Pages: 3
Assignors
CHEN, CHAO-SHUO
Executed: 2020-07-03
CHANG, CHIA-DER
Executed: 2020-07-07
LEE, YI-JING
Executed: 2020-07-14
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO. 8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-77, TAIWAN
Covered Property
(1)
Method for Forming a Source/Drain of a Semiconductor Device having an Insulating Stack in a Recess Structure