IP Library Assignment 054117/0138
Patent Assignment
Reel/Frame 054117/0138

Assignment of Assignor's Interest

Recorded: 2020-10-20 Pages: 3
Assignors
LIN, JING-CHENG
Executed: 2020-10-08
KUO, TA-HAO
Executed: 2020-10-08
Assignee
SKYTECH CO., LTD.
6F., NO.1, JIAZHENG 1ST ST., ZHUBEI CITY,, HSINCHU COUNTY, 302, TAIWAN
Covered Property (1)
Atomic Layer Deposition Equipment Capable of Reducing Precursor Deposition and Atomic Layer Deposition Process Method Using the Same
Application: 17/075,678 →
Publication: US 2022/0119945
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Apr 1, 2022
From: SKYTECH CO., LTD.
To: SKY TECH INC.
Reel/Frame 059579/0887 →