Patent Assignment
Reel/Frame 054245/0169
Assignment of Assignor's Interest
Recorded: 2020-11-02
Pages: 4
Assignors
CHU, LUNG-KUN
Executed: 2020-09-18
HUANG, MAO-LIN
Executed: 2020-09-18
HSU, CHUNG-WEI
Executed: 2020-09-18
YU, JIA-NI
Executed: 2020-09-18
CHIANG, KUO-CHENG
Executed: 2020-09-18
WANG, CHIH-HAO
Executed: 2020-09-24
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTIRAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property
(1)
Metal Gate Patterning Process including Dielectric Fin Formation