Patent Assignment
Reel/Frame 055616/0252
Assignment of Assignor's Interest
Recorded: 2021-03-17
Pages: 2
Assignee
HITACHI HIGH-TECH CORPORATION
17-1, TORANOMON 1-CHOME, MINATO-KU, TOKYO, 105-6409, JAPAN
Covered Property
(1)
Plasma Processing Apparatus and Plasma Processing Method