IP Library Assignment 055935/0883
Patent Assignment
Reel/Frame 055935/0883

Assignment of Assignor's Interest

Recorded: 2021-04-15 Pages: 4
Assignors
WANG, CHIH-CHING
Executed: 2020-12-09
YANG, CHUNG-I
Executed: 2020-12-09
HO, JON-HSU
Executed: 2020-12-09
HSIEH, WEN-HSING
Executed: 2020-12-10
WU, CHUNG-WEI
Executed: 2020-12-16
WU, ZHIQIANG
Executed: 2020-12-16
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Source/Drain Silicide for Multigate Device Performance and Method of Fabricating Thereof
Application: 17/231,925 →
Publication: US 2022/0336614