Patent Assignment
Reel/Frame 056066/0035
Assignment of Assignor's Interest
Recorded: 2021-04-28
Pages: 8
Assignors
NOSAKA, NAOYA
Executed: 2021-04-12
MATSUMURA, YUUSHI
Executed: 2021-04-12
NAKATSU, HIROKI
Executed: 2021-04-12
TAKANASHI, KAZUNORI
Executed: 2021-04-12
NAKAGAWA, HIROKI
Executed: 2021-04-27
Assignee
JSR CORPORATION
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN
Covered Property
(1)
Composition for Resist Underlayer Film Formation, Resist Underlayer Film and Forming Method Thereof, Patterned Substrate-Producing Method, and Compound
Related Assignments
(2)
Other recorded transfers of the patent in this record — the chain of ownership.