IP Library Assignment 056118/0093
Patent Assignment
Reel/Frame 056118/0093

Assignment of Assignor's Interest

Recorded: 2021-05-03 Pages: 3
Assignors
KHADERBAD, MRUNAL A.
Executed: 2019-06-11
TSAI, PANG-YEN
Executed: 2019-06-11
OKUNO, YASUTOSHI
Executed: 2019-06-12
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Selective Dual Silicide Formation Using A Maskless Fabrication Process Flow
Application: 17/306,511 →
Publication: US 2021/0257262