IP Library Assignment 056364/0011
Patent Assignment
Reel/Frame 056364/0011

Assignment of Assignor's Interest

Recorded: 2021-05-26 Pages: 4
Assignors
TSAI, WEI-YU
Executed: 2019-09-25
NIEN, FU-YAO
Executed: 2019-09-25
HUANG, HONG-WEI
Executed: 2019-09-25
LEE, CHANG-SHENG
Executed: 2019-09-25
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
8, LI-HSIN RD. 6, HSINCHU SCIENCE PARK, HSINCHU, 300-78, TAIWAN
Covered Property (1)
Radical Etching in Gate Formation
Application: 16/573,552 →
Publication: US 2020/0105908