IP Library › Assignment 058312/0319
Patent Assignment
Reel/Frame 058312/0319

Assignment of Assignor's Interest

Recorded: 2021-12-06 Pages: 4
Assignors
SHIN, CHEOL
Executed: 2021-12-02
KIM, YONG-DAE
Executed: 2021-12-02
LEE, JONG-HWA
Executed: 2021-12-02
YANG, CHUL-KYU
Executed: 2021-12-02
PARK, MIN-KWANG
Executed: 2021-12-02
WOO, MI-KYUNG
Executed: 2021-12-02
Assignee
S&S TECH CO., LTD.
42 HOSANDONG-RO, DALSEO-GU, DAEGU-SI, 42714, KOREA, REPUBLIC OF
Covered Property (1)
Phase Shift Blankmask and Photomask for Euv Lithography
Application: 17/543,534 →
Publication: US 2022/0236635