IP Library Assignment 059042/0148
Patent Assignment
Reel/Frame 059042/0148

Assignment of Assignor's Interest

Recorded: 2022-02-17 Pages: 2
Assignors
INOUE, KEISUKE
Executed: 2019-06-24
KONDO, SHUNSUKE
Executed: 2019-06-24
OTSUKA, YUYA
Executed: 2019-06-24
Assignee
HITACHI CHEMICAL COMPANY, LTD.
9-2, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-6606, JAPAN
Covered Property (1)
Polishing Method Using Cmp Polishing Liquid
Application: 17/197,991 →
Publication: US 2021/0189179
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Feb 28, 2022
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 059460/0060 →
Change of Name Mar 8, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062992/0805 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →