Patent Assignment
Reel/Frame 059836/0568
Assignment of Assignor's Interest
Recorded: 2022-05-06
Pages: 3
Assignor
LIN, JINYING
Executed: 2022-05-03
Assignee
TOKYO ELECTRON LIMITED
3-1 AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property
(1)
Method For Etching High Aspect Ratio Features Within A Dielectric Using A Hard Mask Stack Having Multiple Hard Mask Layers