Patent Assignment
Reel/Frame 060725/0258
Assignment of Assignor's Interest
Recorded: 2022-08-04
Pages: 3
Assignee
FUJIMI INCORPORATED
1-1, CHIRYO 2-CHOME, NISHIBIWAJIMA-CHO, KIYOSU-SHI, AICHI, JAPAN
Covered Property
(1)
Surface Treatment Method, Method for Producing Semiconductor Substrate Including the Surface Treatment Method, Composition for Surface Treatment, and System for Producing Semiconductor Substrate Including the Composition for Surface Treatment