Patent Assignment
Reel/Frame 061186/0958
Assignment of Assignor's Interest
Recorded: 2022-09-22
Pages: 3
Assignor
GUO, XIAOBO
Executed: 2022-09-08
Assignee
SHANGHAI HUALI INTEGRATED CIRCUIT CORPORATION
NO. 6 LIANGTENG ROAD, PUDONG NEW AREA, SHANGHAI, 201314, CHINA
Covered Property
(1)
Method for Forming Fin Structure in Fin Field Effect Transistor Process and Fin Structure