Assignment of Assignor's Interest

Recorded: 2022-11-17 Pages: 6

Assignors

SEKO, TOMOAKI

Executed: 2022-10-14

ANNO, YUSUKE

Executed: 2022-10-13

NII, AKITAKA

Executed: 2022-10-14

Assignee

JSR CORPORATION

9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Resist Underlayer Film-Forming Composition, Resist Underlayer Film, and Method of Producing Semiconductor Substrate

Application: 17/950,251 →

Publication: US 2023/0053159

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.