Patent Assignment
Reel/Frame 062415/0434
Assignment of Assignor's Interest
Recorded: 2023-01-18
Pages: 5
Assignors
NIIDA, KEISUKE
Executed: 2023-01-05
SAWAMURA, TAKASHI
Executed: 2023-01-05
KORI, DAISUKE
Executed: 2023-01-05
TACHIBANA, SEIICHIRO
Executed: 2023-01-05
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
4-1, MARUNOUCHI 1-CHOME, CHIYODA-KU, TOKYO, 100-0005, JAPAN
Covered Property
(1)
Composition for Forming Protective Film Against Alkaline Aqueous Hydrogen Peroxide, Substrate for Producing Semiconductor Apparatus, Method for Forming Protective Film, and Method for Forming Pattern